Plasma etching

Results: 62



#Item
21Semiconductor device fabrication / Tungsten compounds / Nonmetals / Coatings / Oxide / Etching / Tungsten / Sputtering / Sputter deposition / Chemistry / Matter / Chemical elements

Removal of Hydrogenated Carbon from W-C Deposits by Microwave Oxygen Plasma Alenka Vesel, Miran Mozetič, Peter Panjan, Aleksander Drenik Jožef Stefan Institute Jamova cesta 39, SI-1000 Ljubljana, Slovenia alenka.vesel@

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Source URL: www.djs.si

Language: English - Date: 2012-07-16 15:39:30
22Electrical discharge in gases / Semiconductor device fabrication / Plasma processing / Gas discharge lamps / Plasma physics / Corona discharge / Plasma etching / Plasma / Electric glow discharge / Physics / Chemistry / Electromagnetism

RECOVERY OF AGED ANODE WIRES IN PROPORTIONAL COUNTERS USING A NEGATIVE CORONA DISCHARGE IN 80 % CF4 + 20 % CO2 G.E. Gavrilov, A.G. Krivshich, D.A. Maysuzenko, A.A. Fetisov, N.Yu. Shvetsova 1. Introduction During last few

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Source URL: hepd.pnpi.spb.ru

Language: English - Date: 2015-04-18 12:21:58
23Ions / Matter / Semiconductor device fabrication / Plasma physics / Ion source / Plasma / Reactive-ion etching / Ion gun / Sputtering / Chemistry / Physics / Plasma processing

IonEtch Sputter Ion Gun, GenII The tectra IonEtch ion gun is a filamentless ion source based on a microwave plasma discharge. The IonEtch works by coupling microwave energy into a coaxial waveguide and from there via eva

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Source URL: www.tectra.de

Language: English - Date: 2010-10-02 06:51:58
24Semiconductor device fabrication / Superhydrophobe / Microtechnology / Hydrophobe / Etching / Plasma etching / Chemistry / Chemical properties / Intermolecular forces

CALIFORNIA STATE SCIENCE FAIR 2015 PROJECT SUMMARY Name(s) Project Number

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Source URL: www.usc.edu

Language: English - Date: 2015-04-09 21:01:16
25Microtechnology / Technology / Physics / Reactive-ion etching / Plasma etching / Plasma etcher / Dry etching / Etching / Deep reactive-ion etching / Semiconductor device fabrication / Materials science / Plasma processing

NANOELECTRONICS FABRICATION FACILITY (NFF), HKUST  Standard Operating Manual ___________________________________________________________ Oxford Plasmalab 80 Plus Plasma Etcher

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Source URL: mfz140.ust.hk

Language: English - Date: 2014-07-23 02:45:21
26Technology / Physics / Plasma processing / Etching / Plasma etching / Microelectromechanical systems / Dry etching / Plasma / Microwave / Semiconductor device fabrication / Materials science / Microtechnology

MUEGGE_Poster_MEMS-Stripping-Technology-Tool_Rev00

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Source URL: www.muegge.de

Language: English - Date: 2015-01-07 04:55:26
27Technology / Micro-Opto-Electro-Mechanical Systems / Etching / Mirror / Deep reactive-ion etching / Plasma / Microlens / Dry etching / Reactive-ion etching / Microtechnology / Materials science / Semiconductor device fabrication

TIME-MULTIPLEXED-PLASMA-ETCHING OF HIGH NUMERICAL APERTURE PARABOLOIDAL MICROMIRROR ARRAYS Kerwin Wang, Karl F. Böhringer Electrical Engineering Department, University of Washington Seattle, WA[removed]Phone[removed]

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Source URL: www.ee.washington.edu

Language: English - Date: 2003-07-09 02:25:14
28Physics / Microtechnology / Plasma processing / Spectroscopy / Nanotechnology / Etching / Dry etching / Reactive-ion etching / Polymer / Semiconductor device fabrication / Chemistry / Materials science

Hindawi Publishing Corporation Journal of Nanomaterials Volume 2013, Article ID[removed], 6 pages http://dx.doi.org[removed][removed]Review Article

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Source URL: downloads.hindawi.com

Language: English - Date: 2014-08-28 12:52:18
29Technology / Plasma processing / Etching / Reactive-ion etching / Wafer / Photolithography / Chemical vapor deposition / Microelectromechanical systems / Semiconductor device fabrication / Materials science / Microtechnology

Molecular Devices: A Potential Replacement for Semiconductors Anthony Moeller NIST Semiconductor Electronics Division July 27, 2004

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Source URL: spsnational.org

Language: English - Date: 2006-11-14 11:17:28
30Technology / Microelectromechanical systems / Etching / Wafer / Microfabrication / Deep reactive-ion etching / Chemical-mechanical planarization / Thermal oxidation / Silicon on insulator / Semiconductor device fabrication / Materials science / Microtechnology

A new low-temperature high-aspect-ratio MEMS process using plasma activated wafer bonding

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Source URL: deepblue.lib.umich.edu

Language: English - Date: 2013-09-17 15:11:17
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